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Ecopia HMS-3000霍尔效应测试仪
Ecopia HMS-3300高温霍尔效应测试仪
Ecopia HMS-5000全自动变温霍尔效应测试仪
Ecopia HMS-7000光霍尔效应测试仪
真空快速退火炉(RTP)
RTP-100-RP快速退火炉(中温/低价位)
大尺寸快速退火炉(12英寸) - 适合光伏样品
EPS-300手动探针台
EPS-1000探针台
SPS-2200手动探针台
半导体行业专用仪器
喷射化学气相沉积设备(Spray CVD)
石墨烯生长炉
低压化学气相沉积系统(LPCVD)
二维材料生长设备(MoS2, h-BN, CNT等)
快速热化学气相沉积系统(RTCVD)
金属有机化学气相沉积系统(MOCVD)
光刻机
等离子去胶机
匀胶机,旋涂仪
半自动球焊机,焊线机(Wire Bonder)
制冷设备
液氦液氮低温恒温器(开循环)
闭循环致冷机、低温恒温器
超低振动闭循环致冷机(3~5纳米振动水平)
超高真空闭循环致冷机
顶端装样方式低温恒温器(Top Loading)
ARS气体混合低温恒温器
制样/消解设备
反应离子刻蚀机RIE
Harrick Plasma等离子清洗机
离子束刻蚀系统IBE
光刻机/紫外曝光机(Mask Aligner)
等离子体热处理炉
电化学仪器
WEP CVP21电化学C-V剖面浓度分析仪- ECV Profiler
QCM-I耗散型石英晶体微天平
OWLS光波导模式谱仪
比表面积测定仪
SKP5050扫描开尔文探针系统
Rame Hart接触角测量仪
测厚仪
光反射薄膜厚度测量仪
光谱检测分析仪
激光拉曼光谱仪
光学仪器及设备
光谱型椭偏仪Ellipsometer
包装行业专用仪器
MEMS用高真空密封机
相关仪表
变场磁体Variable Flux Magnet
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Etching of metals which do not have volatile compounds such as Cu, Au cannot be accomplished in RIE systems. On the other hand, physical etching with accelerating Ar ions is possible. Typically surface is patterned with thick resist for masking, and the energetic ion flux during etching overheats the substrate and the resist. Unless efficient means of removing the heat is found resist becomes very difficult to remove.
We have demonstrated capability of keeping substrate temperature below 50 °C along with wafer rotation to achieve the desired uniformity which makes it possible to etch wafers with resist pattern.
Features
1. 不锈钢方型离子束腔体 14.5" SS Cube ion beam chamber
2. 1000伏直流离子枪 12 cm DC Ion gun 1000V, 500 mA ,DC motor driven SS shutters
3. 离子束中和器 Ion Beam neutralizer
4. 质量流量控制的氩气路 Ar MFC
5. 6"水冷基底卡盘 Chilled water cooled 6” substrate platen
6. 晶圆旋转 Wafer rotation 3-10 RPM, Vacuum stepper motor
7. 晶圆倾斜 Wafer Tilt with a stepper motor through differentially pumped rotational seal
8. 样品自动取放 Manual or Auto wafer load/unload
9. 刻蚀速度 Typical Etch Rates: 200A/min Cu, 500A/min Si
10. 刻蚀均匀性 +/-5% etch uniformity over 4“ area
11. 真空度 5x 10-6 Torr < 20 minutes <2 x10-7 Torr (2 days) Base Pressure with 500 l/sec turbo
12. 极限真空度 8x10-8 Torr Base pressure with 1000 l/sec Turbo pump
13. 磁控溅射氮化硅保护金属表面不被氧化 Magnetron Sputtering of Si3N4 to protect etched metal surfaces from oxidation
14. 计算机控制 PC Controlled with LabVIEW Software
15. 菜单驱动,密码保护 Recipe Driven, Password Protected
16. 全安全互锁 Fully Safety Interlocked